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Understanding a semiconductor process using a full-scale model

IEEE Transactions on Semiconductor ManufacturingPublished 1 May 2002
J. Hunter, D. Delp, Donald W. Collins, Jennie Si
Citations24
SJR quartileQ2
SJR score0.67
SNIP1.25

TL;DR

A full-scale semiconductor manufacturing plant model developed from a SEMATECH dataset was developed to study the complex interactions and characteristics of a semiconductor fabrication process to demonstrate the accuracy of the simulation model built from the SEMATech dataset.

Abstract

A full-scale semiconductor manufacturing plant model was developed from a SEMATECH dataset using the computer software package EXTEND. The model was generated to study the complex interactions and characteristics of a semiconductor fabrication process. Equipment downtimes, process flow routes, and machine processing times were used to validate the model. Pilot runs of the model were used to determine simulation run times and data collection rates for the initial inventory and product cycle time measurements. The product cycle time results from the model at 95% capacity were within 63 hours (or 7%) of the SEMATECH cycle time measurements. These results demonstrate the accuracy of the simulation model built from the SEMATECH dataset. The full-scale model was set up to run special scenarios showing the effects of eliminating maintenance and changing product types. The full-scale model was compared to a small-scale model based on the same dataset to demonstrate the inadequacy of the validated small-scale model. A full-scale model is also useful for analyzing scheduling routines, detecting bottlenecks, and understanding machine relations in the semiconductor industry.

Keywords

Engineering